JX Nippon Mining & Metals USA, Inc
10 Post Office Square , 8th Floor, Boston, Massachusetts, United States

JX Nippon Mining & Metals, formerly Nikko Metals, is a recognized leader in the field of high purity metals and wafers used in the microelectronics and communications industries.

JX Nippon Mining & Metals offers a wide variety of sputtering targets for demanding thin film applications including semiconductor, data storage, and optical films. Our InP and CdTe wafers are widely used for compound semiconductor and IR sensor applications.

JX Nippon Mining & Metals is well-known for delivering high quality electronic materials that meet and exceed the expectations of our customers and is consistently acknowledged as a top supplier.

JX Nippon Mining & Metals is a leading supplier of consumable electronic materials. Products include sputtering targets for semiconductors, sputtering targets for flat panel displays, sputtering targets for data storage devices, and wafers for compound semiconductors. We support our customers globally with manufacturing plants in the U.S. and Japan and sales offices worldwide.

Constant enhancement of materials and cooperation with major equipment manufacturers, as well as our customers, are the keys to our unsurpassed performance.

We continually strive to improve materials for current devices, develop new materials for upcoming devices, and meet ever-changing industry requirements. Our standard-setting research and development labs have created and developed the best-performing electronic materials available anywhere.

Our integrated manufacturing process assures consistent quality, stable materials and a low cost. Our manufacturing facilities in the U.S. and Japan assure customers of a stable and timely supply of materials anywhere in the world.

We support our customers internationally with manufacturing plants in the U.S. and Japan and sales offices in six countries worldwide.

Organization

JX Nippon Mining & Metals USA operates under JX Group, a global enterprise active in a wide array of businesses including petroleum products, non-ferrous metals and specialty electronic materials.

JX Nippon Mining & Metals has a worldwide infrastructure of manufacturing facilities, R&D and support offices to serve all of our customers. JX Nippon Mining & Metals supports its customers through a large staff of advanced materials science engineers. Our team of specialists has a comprehensive understanding of the process and production issues facing customers, and works directly with equipment and process engineers to deliver personalized support solutions

Manufacturing Facilities

To support our worldwide customer base of sputtering target and ACROTEC compound semiconductor materials users, manufacturing facilities are located in both Japan the United States. Both sites are state of the art facilities which utilize the best equipment available, in addition to a highly trained staff with extensive knowledge in their areas of expertise.

JX Nippon Mining & Metals has one of the largest analytical labs in the industry, with the latest in metrology equipment. We utilize both destructive and non-destructive testing to support quality control, research and development, and special technical requests.

JX Nippon Mining & Metals offers a wide range of sputtering targets for advanced thin film applications including: semiconductor, flat panel display, and data storage.

Target materials are available in a variety of grades and purities to meet specific customer requirements. Target microstructure and magnetic permeability (for ferro-magnetic materials) are also controlled to maximize target performance.

Targets are available in configurations for all major PVD sputtering systems. Expertise and extensive experience with a variety of bonding technologies (solder bonding, electron-beam welding, and diffusion bonding) assures bonding efficiency without affecting target microstructure.

JX Nippon Mining & Metals is the number one supplier of ITO(indium tin oxide) worldwide for use in flat panel display manufacture. Our ITO is available in an Ultra-high density grade for an extremely high quality thin film with low particulates.

Other sputtering target materials for optical thin films are available and include: molybdenum, tungsten, aluminum alloys and titanium.

JX Nippon Mining & Metals offers a full line of sputtering targets that meet the high quality requirements for magnetic head and media (rigid disk and optical disk) manufacturing. Targets feature fine control of magnetic properties and alloy composition.

• Aluminum Alloys
• Chromium Alloys
• Cobalt/Cobalt Alloys
• Copper/Copper Alloys 
• Indium Tin Oxide (ITO)
• Iridium Alloys
• Manganese Alloys
• Molybdenum-Si
• Nickel Aluminum
• Nickel Iron
• Nickel Platinum
• Platinum Alloys
• Ruthenium
• Tantalum/Tantalum Alloys 
• Tantalum Silicide
• Titanium/Titanium Alloys
• Tungsten
• Tungsten Silicide
• others